ELIONIX INC. Introduction of ELS-F125G8

Speaker:    Mr. Yuki Matsuo

Time:        10:00-11:00, June 3

Location:    SIST 1A-200

Host:       Prof. Xufeng Kou

Abstract:

ELIONIX is a leading manufacture for Electron Beam Lithography System. ELIONIX has contributed to the development for advanced nanolithography(sub-10nm size) together with academic scientists and R&D scientists internationally since more than 40 years ago.

ELS-F125G8 is a most prestigious EBL tool in its class. It is possible for high resolution nanolithography such as less than 8nm with more 8inch lithography capability. World’s first acceleration voltage,125keV, can make all users possible to fabricate challenging patterns because of the principle of 125keV i.e. less forward scattering and less back scattered affection. In addition, practically large beam current keeping it’s small diameter can reduce the writing time with the same writing quality brings the faster outcome to you, as results, total development terms can be saved. Write Field @ 125keV is possible up to 500um but the electron beam quality(Gaussian distribution) can be promised with high uniformity even to the edge of Write Field of 500um thanks to ELIONIX’s dynamic Focus & stigma correction technology.

Furthermore, ELIONIX’s key technology for stitching error(10nm) or overlay error (10nm) will be talked without exaggeration.

The company introduction, products introduction/specifications and stimulus application data will be introduced in this talk session.

Bio:

Yuki Matsuo

ELIONIX INC. International Sales PA region Manager

Bachler Degree from Keio University (Japan), Master Degree from Shizuoka University(Japan)(to 2009)

R&D Technical engineer in Hamamatsu Photonics K.K(Japan) (to 2015)

The Academic research field : Surface Plasmon / Single Photon Acquisition using Si substrate

Company R&D field : Single Photon Acquisition, MEMS-FTIR